Deposition behavior of Si on insulating and conducting substrates in the CVD process approach by charged cluster model

Submitted by admin on Mon, 01/15/2018 - 11:09

c_cosidx: 

157

topics: 

Deposition behavior of Si on insulating and conducting substrates in the CVD process approach by charged cluster model

c_moddate: 

2008-12-04 13:23:41

c_orderno: 

6

c_matidx: 

144

course: 

Thermodynamics of Materials

files: 

3180.pdf (eng)