Effect of substrates on morphological evolution of a film in the silicon CVD process approach by charged cluster model

Submitted by admin on Mon, 01/15/2018 - 11:09

c_cosidx: 

157

topics: 

Effect of substrates on morphological evolution of a film in the silicon CVD process approach by charged cluster model

c_moddate: 

2008-12-04 13:25:45

c_orderno: 

9

c_matidx: 

147

course: 

Thermodynamics of Materials

files: 

3183.pdf (eng)